Developer for photoresist

Developer for Photoresist, 20 grams. To prepare a developer bath, dissolve 20 grams of developer in 2 liters of water.

During photoresist development, the UV-exposed areas of the resist layer are removed. The prepared developer solution is poured into a suitable tray, after which the circuit board is immersed in the bath. The resist dissolves on UV-exposed surfaces, while unexposed resist remains intact. This remaining resist serves as a protective layer for the copper surface during the subsequent etching step, where unprotected copper areas are removed.

Warning: The developer is corrosive in its concentrated form and can cause severe damage to skin and eyes. Even in diluted form, it may cause irritation to skin and eyes.

• Always use protective gloves and safety goggles when handling the chemical.
• Always add the developer to water ? never the other way around. This minimizes the risk of rapid reactions and splashing.

Warning:
Contains: Sodium hydroxide

Hazard Statements:
H314 ? Causes severe skin burns and eye damage

Precautionary Statements:
P102 ? Keep out of reach of children
P280 ? Wear protective gloves/protective clothing/eye protection/face protection
P301 + P330 + P331 ? IF SWALLOWED: Rinse mouth. Do NOT induce vomiting
P303 + P361 + P353 ? IF ON SKIN (or hair): Take off immediately all contaminated clothing. Rinse skin with water/shower
P305 + P351 + P338 ? IF IN EYES: Rinse cautiously with water for several minutes. Remove contact lenses if present and easy to do. Continue rinsing