Product description
20 grams of photoresist developer, mix with 2?litres of water.
During development, the UV-exposed areas of the photoresist are removed. The developer is mixed with water, and the PCB is dipped into the solution. On the areas exposed to UV light, the photoresist becomes soluble and dissolves. The remaining resist protects the copper layer, ensuring that only unprotected areas are etched (in the next step).
Warning! The developer is corrosive in concentrated form and may cause severe skin and eye injuries. Even when diluted, it can still cause irritation. Always wear protective gloves and safety goggles when handling the developer.
Always add the developer to water ? never the reverse ? this minimizes the risk of splashing, as the developer may react vigorously when in contact with water.
Danger:
H314 Causes severe skin burns and eye damage.
P102 Keep out of the reach of children.
P280 Use protective gloves/protective clothing/eye protection/face protection.
P301+P330+P331 IF SWALLOWED: Rinse mouth. DO NOT induce vomiting.
P303+P361+P353 IF ON SKIN (including hair): Take off immediately all contaminated clothing. Rinse skin with water/shower.
P305+P351+P338 IF IN EYES: Rinse cautiously with water for several minutes. Remove any contact lenses if possible. Continue rinsing.
